Pico-K

Experience the next generation of Pico laser technology with PICO-K.

Designed to deliver shorter pulse duration and higher peak power for superior clinical results.

Pulse Duration & Peak Power

PICO-K maintains a standard deviation of only around 2% of the 300 ps pulse duration, ensuring maximum peak power of 2.0 GW and a high-quality beam profile at any pulse repetition rate. This means that users can rely on the device to deliver precise and consistent laser treatment with minimal side effects.

300 ps
Pulse Duration
2.0 GW
Peak Power

Why Choose Pico-K

Ultra-Fast Picosecond Pulses

Ensures precise and effective fragmentation of pigmentation and tattoo ink with minimal thermal damage.

Four Multi-Wavelengths

Offers unparalleled flexibility for treating a wide range of colors and pigmentation issues.

High-Quality & Stable Beam

Delivers consistent, reliable performance even at high repetition rates.

Proven Clinical Results

Successfully treats resistant pigmentation and tattoos of all colors while promoting effective skin rejuvenation.

Various Handpieces

PICO-K provides optimized treatment solutions with a versatile selection of specialized handpieces. Depending on the location, color, and specific characteristics of skin lesions, practitioners can choose the most appropriate handpiece to achieve precise clinical outcomes. This adaptability ensures that treatments are tailored to individual patient needs, resulting in more effective procedures and improved overall results.

Available Handpieces:

  • Zoom Handpiece (1064 & 532 nm): Designed for targeted treatments with adjustable spot sizes.
  • Collimated Handpiece (1064 & 532 nm): Offers uniform energy delivery for consistent results.
  • MLA Handpiece (1064 & 532 nm): Utilizes a micro-lens array for fractional treatments.
  • 585 Handpiece (585 nm): Specialized for vascular and pigmented lesions.
  • 650 Handpiece (650 nm): Ideal for deeper pigmentation and selective lesion targeting.

By offering this wide range of options, PICO-K empowers clinicians to customize each treatment plan, enhancing both patient satisfaction and clinical success.

Patented Technologies

The patented technology utilizes a mechanical switch and micro-controller to control the thermal lens effect, resulting in a stable output energy and consistent beam size. This ensures that the Pico-K laser maintains a uniform level of beam size during treatment.

When a laser heats up a lens, it can cause the lens to swell, which in turn shortens the laser’s focal point and reduces the size of the laser spot on the skin surface. This can result in the delivery of more energy than the intended level, leading to clinical side effects and potentially damaging the internal components of the device over time. However, with the patented technology, Pico-K effectively controls and minimizes the thermal lens effect, ensuring that the spot size of the Pico-K remains consistent and at the selected size.

Features

Leading Picosecond Technology

Ultra-short pulses deliver unmatched efficiency in pigment and tattoo removal.

Effective on Resistant Cases

Highly effective against stubborn pigmentation that other lasers may fail to treat.

Exceptional Beam Quality

Top-Hat beam ensures uniform energy distribution, minimizing side effects and maximizing safety.

Comprehensive Treatment Flexibility

Multiple wavelengths and handpieces provide customizable solutions for various skin concerns.

High Reliability & Stability

Maintains alignment and consistent performance even under demanding conditions.

Indications

Toning

Toning

Melasma

PIH

Tatoo Removal

Tatoo Removal

Black Tatoo

Colored Tatoo

Epidermal Pigments

Epidermal Pigments

Solar Lentigo 

Freckles

Seborrheic Keratosis

Cafe-au-Lait

Rejuvenation

Rejuvenation

Wrinkle

Acne Scar

Enlarged Pore

Dermal Pigments

Dermal Pigments

Naevus of Ota

ABNM

Specifications

Item Description
Wavelength
1064 nm, 532 nm

*Optional: 585 nm, 650 nm
Beam Mode
Top Hat
Pulse Duration
300 ps
Pulse Energy
Max. 600 mJ @ 1064 nm

Max. 300mJ @ 532 nm
Repitition Rate
1 – 10 Hz
Peak Power
2.0 GW
Handpiece

585: 3nm

650: 3mm
Zoom H/P: 2 – 10 mm

Collimated H/P: 8 mm

MLA H/P: 4 – 12 mm

585: 3 mm

650: 3 mm